Niobium Oxide Rotatable Sputter Targets

Nb₂O_x, 99.9 - 99.99% pure

Rotatable magnetron sputter deposition has become the most widely used coating technology for large area deposition. The glass industry has introduced advanced coating technologies as the demand for value-added products for the glass industry continues to grow. Magnetron sputtering is a vacuum coating process and one of the core methods for depositing thin films on glass. Rotatable targets offer increased deposition rates and improved performance and sputter rates. There is less production downtime and higher production yields.

Niobium Oxide thin film coatings are extensively used by large area glass coating manufacturing in the architectural glass industry, flat panel display glasses and web coating glasses.

Composition                                      Nb₂O_x

Process                                              Plasma Spraying

Purity                                                  99.9% - 99.99%

Theoretical Density                          4.47 gm/cm³

Actual Density                                   4.25 gm/cm³

Grain Size                                          < 250 microns

Porosity                                              < 1.0%

Straightness Tolerance                   < 0.5 mm/Meter

Backing Tube                                    Stainless Steel-304 tube

Maximum Outside Diameter           200 mm

Maximum Length                              4 meters

Typical Impurities (Nb₂O₅, 99.99% pure):

Tantalum        < 150 ppm

Iron                    < 50 ppm

Aluminum        < 50 ppm

Silicon              < 50 ppm

Molybdenum  < 30 ppm

Copper             < 30 ppm

Nitrogen          < 30 ppm

Tin                    < 20 ppm

Tungsten         < 20 ppm