Aluminum Oxide Sputtering Targets

Al₂O₃

Aluminum oxide, or Al₂O₃, is the most commonly occurring of several aluminum oxides, and specifically identified as aluminum (III) oxide. The aluminum oxide sputter target is commonly called alumina sputter target

Chemical Compound:                                   Aluminum Oxide

Symbol:                                                            Al₂O₃

Purity:                                                               99.99% or 99.999%

Color/Appearance:                                        White, Crystalline Solid

Melting Point:                                                  2,072°C

Coefficient of Thermal Expansion:              8.1x 10^-6/K

Theoretical Density:                                       3.97 g/cm³

Z Ratio:                                                             0.336

Sputter:                                                            RF-R

Max Power Density:                                       20 Watts/Square Inch

Type of Bond:                                                 Indium

Applications:

Aluminum oxide sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc.

Aluminum oxide thin films which can be obtained by aluminum oxide sputtering targets are widely used in many mechanical, optical and microelectronic applications because of their excellent properties, mechanical strength and hardness, transparency, high abrasion and corrosion resistance, as well as insulating and optical properties.

Available Sizes: 

Diameter:                     1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, Custom size on request
Typical Thickness:     0.125″, 0.250″