Aluminum Oxide Sputtering Targets


Al2O3

 

Aluminum oxide, or Al2O3, is the most commonly occurring of several aluminum oxides, and specifically identified as aluminum (III) oxide. The aluminum oxide sputter target is commonly called alumina sputter target

 

Chemical Compound:                                   Aluminum Oxide

Symbol:                                                            Al2O3

Purity:                                                               99.99% or 99.999%

Color/Appearance:                                        White, Crystalline Solid

Melting Point:                                                  2,072°C

Coefficient of Thermal Expansion:              8.1x 10-6/K

Theoretical Density:                                       3.97 g/cm3

Z Ratio:                                                             0.336

Sputter:                                                            RF-R

Max Power Density:                                       20 Watts/Square Inch

Type of Bond:                                                 Indium

 

Applications:

The aluminum oxide sputtering target is a crucial material for thin film deposition across various industries. It is widely employed in applications such as fuel cells, decorative coatings, semiconductors, displays, LEDs, photovoltaic devices, and glass coatings.

Thin films derived from aluminum oxide sputtering targets offer exceptional performance due to their superior properties, including high mechanical strength and hardness, optical transparency, excellent abrasion and corrosion resistance, and outstanding insulating and optical characteristics. These qualities make aluminum oxide thin films indispensable in mechanical, optical, and microelectronic applications.

 

Available Sizes: 

Diameter:                     1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, Custom size on request
Typical Thickness:     0.125″, 0.250″