Gadolinium Oxide Sputtering Targets

Gd₂O₃

99.9% - 99.95% - 99.99% pure

Gadolinium Oxide Sputtering Targets are manufactured by hot or cold pressing - Sintering, and Elastomer bonding to a backing plate.

(Indium Bonding and Elastomer Bonding are available for Gadolinium Oxide Sputtering Target.)

Rare Earth ceramic targets and other Ceramic targets (oxides, carbides, nitrides and fluorides) are made by hot pressing the high purity rare earth composites under high temperature.

Applications:  Ferroelectric, Gate Dielectrics and for CMOS

 Gadolinium oxide sputtering Targets are used to form a film on the substrate of glass, metal or   other materials. Its purpose is either to protect the substrate or improve its properties.

                            Material Type:                    Gadolinium Oxide

                            Compound Formula:        Gd₂O₃

                            Molecular Weight:            362.5

                            Appearance:                      White

                            Melting Point:                    2,420° C (4,388° F)

                            Density:                              7.407 g/cm³

 Circular:           Diameter ≤ 14 inch, Thickness ≥ 1 mm
Rectangular:   Length ≤ 32 inch, Width ≤ 12 inch, Thickness ≥ 1 mm

Custom sizes are available.