Ruthenium IV Oxide Sputter Targets

RuO₂, 99.95% pure

Applications: RuO₂ is extensively used for the coating of titanium anodes for the electrolytic production of chlorine and for the preparation of resistors or integrated circuits. Direct current reactive sputtering deposition of ruthenium oxide thin films is performed to produce solid-state Thin-Film Supercapacitors.

Specifications:

  Purity                         99.95%

  Formula                    RuO₂

  CAS#                         12036-10-1

  Density                      6.97 gm/cm³

  Melting Point            1200^oC

  Sputter                      RF, RF-R, DC

  Bonding types         Indium or Elastomer

 Ruthenium Oxide Sputter Targets are available in circular and rectangular designs.

Circular:              Diameters 1 inch to 14 inch

                            Thickness from 1 mm

Rectangular:      Length: to 32 inch maximum (Multi-piece construction is available)

                            Width:   to 12 inch maximum (Multi-piece construction is available)

                            Thickness: from 1 mm

Safety Data Sheet (pdf)