Aluminum Sputtering Targets

Al, 99% – 99.999% pure

 

Applications:

Aluminum deposition via sputtering and vacuum evaporation creates high-performance thin films that meet the demanding requirements of modern optical, electronic, and decorative applications. When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

These techniques enable precise control over film properties such as thickness, uniformity, and adhesion, making them vital in industries that depend on reliable, high-quality coatings.

 

                                       Technical Specifications:

Molecular Weight                              26.98

Appearance                                        Metallic, Silvery in Color

Melting Point                                      660.37oC

Boiling Point                                        2467oC

Density                                                 2.699 gm/cm3

Coefficient of Thermal Expansion   23.1 x 10-6/K (25oC)

Thermal Conductivity                        235 W/m.K

Vickers Hardness                                167 MPa

Sputter                                                  DC

Z Ratio                                                   1.08

Bond Type                                            Indium, Elastomer

 

 

                                                      Aluminum Sputtering Targets are available in diameters from 1.00 inch up to 12.00 inch with

                                                      thickness from 1 mm to 6.35 mm (0.250”).