Alumina-Zinc Oxide Sputter Targets

(AZO)

 

Formula/Composition:                         ZnO / Al2O3, 98/2 wt%

Sputtering Processes:         RF or DC magnetron sputtering and Rotary Target Sputtering

 

Application Overview AZO (Aluminum-doped Zinc Oxide) targets play a crucial role in various industries, particularly in thin film technology. They are extensively used in:

  • Thin Film Solar Cell Electrode Films – Enhancing the efficiency and conductivity of solar panels.
  • Low-E Glass Films – Contributing to energy-efficient glazing solutions.

 

AZO-coated substrates serve multiple applications, including:

·        Electrodes for flat panel displays

·        Touch panel contacts

·        Energy-efficient automotive and architectural window glass

·        Optoelectronic devices

·        Solar panels

·        Additional specialized applications

 

Technical specifications:

Purity:                                                     99.9 – 99.99% pure

Relative Density                                    > 99%

Theoretical Density (2 wt% Al2O3):     5.61 gm/cm3

Recommended Bonding type:           Indium

Target Power Density:                         ~3 – 4 W/cm2 with an O2 to Ar flow rate ~ 2:1

Operating Total Pressure:                   ~6 Torr

Substrate Temperature:                      ~200oC

 

 

AZO Targets are available as circular or rectangular targets of 2 inch to 8 inch diameters and up to 16 inch lengths. Typical thickness is 0.125 inch (3 mm) or 0.250 inch (6 mm).  Custom sizes are available upon request.