Alumina-Zinc Oxide Sputter Targets

(AZO)

Formula/Composition:                         ZnO / Al₂O₃, 98/2 wt%

Sputtering Processes:         RF or DC magnetron sputtering and Rotary Target Sputtering

Application: AZO targets are widely used in Thin Film Solar Cell Electrode Film, Low-e glass film.

AZO-coated substrates include electrodes for flat panel displays, touch panel contacts, energy saving automobile and building window glass, optoelectronic devices, solar panels and etc.

Technical specifications:

Purity:                                                     99.9 – 99.99% pure

Relative Density                                    > 99%

Theoretical Density (2 wt% Al₂O₃):     5.61 gm/cm³

Recommended Bonding type:           Indium

Target Power Density:                         ~3 – 4 W/cm² with an O₂ to Ar flow rate ~ 2:1

Operating Total Pressure:                   ~6 Torr

Substrate Temperature:                      ~200^oC

AZO Targets are available as circular or rectangular targets of 2 inch to 8 inch diameters and up to 16 inch lengths. Typical thickness is 0.125 inch (3 mm) or 0.250 inch (6 mm).  Custom sizes are available upon request.